发明名称 VACUUM DEPOSITION DEVICE AND VACUUM DEPOSITION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To continuously form a fluoride thin film of magnesium fluoride or the like having reduced optical absorption of visible light and having satisfactory adhesion on a plastic base material by a vacuum deposition process at a high speed and also at an extremely stable film deposition rate. <P>SOLUTION: The vacuum deposition device within a vacuum tank (1) is provided with: an unwinding part (2) continuously unwinding a plastic film (2); a winding part (3) winding the plastic film (4) unwound from the unwinding part (2); a main roll (5) arranged between the unwinding part (2) and the winding part (3); a vapor deposition material (6) composed of a solid material having high material density and fine vacancies or a granule material having high pack density or a mixed material of the solid material and the granule material, also comprising a fluoride essentially consisting of magnesium fluoride and also arranged so as to be confronted with the main roll (5); an electron gun (7) emitting an electron beam to the evaporation material (6); and a feeding means continuously feeding the vapor deposition material (6). <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008266728(A) 申请公布日期 2008.11.06
申请号 JP20070111664 申请日期 2007.04.20
申请人 TOPPAN PRINTING CO LTD 发明人 RO KAZUYOSHI
分类号 C23C14/24;B32B9/00;C23C14/30;C23C14/56;G02B1/11 主分类号 C23C14/24
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