发明名称 PHOTOCATALYST SEMICONDUCTOR ELEMENT, ITS PRODUCTION METHOD, PHOTOCATALYST OXIDATION-REDUCTION REACTION APPARATUS AND PHOTOELECTROCHEMICAL REACTION EXECUTING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photocatalyst semiconductor element consisting of group III to V element nitride semiconductor which can be formed on various substrates and which improves utilization efficiency of a carrier produced by light irradiation and to provide its production method, a photocatalyst oxidation-reduction reaction apparatus and a photoelectrochemical reaction executing method by which oxidation-reduction reaction can be produced by light irradiation. <P>SOLUTION: The photocatalyst semiconductor element comprises an electroconductive substrate and the group III to V element nitride semiconductor formed thereon in a shape of a dot or in a shape of a rod. A production method of the photocatalyst semiconductor element, the photocatalyst oxidation-reduction reaction apparatus and the photoelectrochemical reaction executing method are also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008264769(A) 申请公布日期 2008.11.06
申请号 JP20080058107 申请日期 2008.03.07
申请人 TOHOKU UNIV 发明人 YAO TAKAFUMI;FUJII KATSUSHI
分类号 B01J35/02;B01J27/24;B01J37/02;H01M14/00 主分类号 B01J35/02
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