| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for lift-off that can achieve both adhesiveness and detachability with a substrate and is excellent in halation preventive performance with less outgas generated from a resist film, and a resist pattern forming method. <P>SOLUTION: The negative resist composition for lift-off contains: 0.5-50 pts.wt. of (B) ethylene-based unsaturated compound; 0.01-30 pts.wt. of (C) silane coupling agents; 0.5-20 pts.wt. of (D) photopolymerization initiator; and 0.01-10 pts.wt. of (E) light absorption agents per 100 pts.wt. of acrylic resin having (A) a polymerizable unsaturated group. A resist pattern forming method that uses the composition is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
