| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus whose illustrative object is to reduce the number of times of calibrations of a measuring means. <P>SOLUTION: This exposure apparatus has a first measuring means for measuring the light via the projection optical system and a reference surface provided on a substrate stage, and a second measuring means for measuring the position of an object surface provided on the substrate stage in the direction of the optical axis in order to measure the position of the image surface of a projection optical system in the direction of the optical axis of the projection optical system, carries out the calibration of the second measuring means based on the measured position of the image surface and the position of the reference surface as the object surface, measures the position of the surface of the substrate as the object surface provided on the substrate stage by the second measuring means, positions the substrate stage based on the measured position of the surface, and computes the relative change amount between the output of the first measuring means and the output of the second measuring means after the calibrations based on the output of the first measuring means after calibration in the state wherein the reference surface being positioned by the substrate stage, and the output of the second measuring means after calibration which makes the reference surface in that state the object surface. <P>COPYRIGHT: (C)2009,JPO&INPIT |
