| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent in pattern profile after being subjected to heat treatment. <P>SOLUTION: The photosensitive resin composition comprises (a) a resin having a repeating unit represented by general formula (1), (b) a resin other than the resin (a), (c) a photoacid generator and (d) a photoacid generator other than the photoacid generator (c). <P>COPYRIGHT: (C)2009,JPO&INPIT |
