发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR MAKING MICROARRAY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for making a microarray, in which a monomolecular film is not detached when a target molecule is immobilized on the substrate using the monomolecular film having a silicon oxide chain. <P>SOLUTION: The method for manufacturing the substrate for making the microarray comprises at least a step of forming a monomolecular film on the substrate using a silane compound. The monomolecular film is formed using a solution comprising the silane compound and a nitrogen-containing organic base in the step. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008268178(A) 申请公布日期 2008.11.06
申请号 JP20080003827 申请日期 2008.01.11
申请人 SHIN ETSU CHEM CO LTD 发明人 KUSAKI WATARU;KANOU TAKESHI;ISHIHARA TOSHINOBU
分类号 G01N33/543;G01N33/53;G01N37/00 主分类号 G01N33/543
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