发明名称 |
METHOD FOR MANUFACTURING SUBSTRATE FOR MAKING MICROARRAY |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for making a microarray, in which a monomolecular film is not detached when a target molecule is immobilized on the substrate using the monomolecular film having a silicon oxide chain. <P>SOLUTION: The method for manufacturing the substrate for making the microarray comprises at least a step of forming a monomolecular film on the substrate using a silane compound. The monomolecular film is formed using a solution comprising the silane compound and a nitrogen-containing organic base in the step. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2008268178(A) |
申请公布日期 |
2008.11.06 |
申请号 |
JP20080003827 |
申请日期 |
2008.01.11 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
KUSAKI WATARU;KANOU TAKESHI;ISHIHARA TOSHINOBU |
分类号 |
G01N33/543;G01N33/53;G01N37/00 |
主分类号 |
G01N33/543 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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