发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a high frequency semiconductor device for which the mechanical strength of air bridge wiring is improved. SOLUTION: The semiconductor device includes: a first wiring layer 12 formed on a semiconductor substrate 11; second and third wiring layers 13-1 and 13-2 disposed in a direction intersecting with the first wiring layer 12 on both sides of the first wiring layer 12; and an air bridge wiring layer 14 for interconnecting the second and third wiring layers 13-1 and 13-2 sandwiching an air layer above the first wiring layer 12 therewith. The overall shape of the air bridge wiring layer 14 has an upward convex curvature in an arch shape and the transverse sectional shape of the air bridge wiring 14 is in the form of a downward concave curvature. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008270617(A) 申请公布日期 2008.11.06
申请号 JP20070113430 申请日期 2007.04.23
申请人 TOSHIBA CORP 发明人 ASANO TAKASHI
分类号 H01L21/768;H01L21/822;H01L23/522;H01L27/04 主分类号 H01L21/768
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