发明名称 |
Novel Ruthenium-Based Materials and Ruthenium Alloys, Their Use in Vapor Deposition or Atomic Layer Deposition and Films Produced Therefrom |
摘要 |
An alloy for use in vapor deposition or atomic layer deposition is described herein that includes ruthenium and at least one element from group IV, V or VI of the Periodic Chart of the Elements or a combination thereof. In addition, a layered material is described herein that comprises at least one layer that includes a ruthenium-based material or ruthenium-based alloy and at least one layer that includes at least one element from group IV, V or VI of the Periodic Chart of the Elements or a combination thereof. |
申请公布号 |
US2008274369(A1) |
申请公布日期 |
2008.11.06 |
申请号 |
US20050911954 |
申请日期 |
2005.04.21 |
申请人 |
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发明人 |
LEE EAL H.;TRUONG NICOLA;PRATER ROBERT;DIANA MORALES |
分类号 |
B32B15/00;B32B9/00;C22C5/04;C23C14/34 |
主分类号 |
B32B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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