| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus with significantly reduced image-formation errors due to air flows and pressure waves in a process zone. <P>SOLUTION: The lithographic apparatus includes an illumination system configured soas to adjust a radiation beam, a support constructed to support a patterning device, capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target part of the substrate; and a shield device arranged between a source for air flows and/or pressure waves, and an element sensitive to air flows and/or pressure waves. <P>COPYRIGHT: (C)2009,JPO&INPIT |
