发明名称 GELATINOUS PLATING COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a gelatinous plating composition which is used in electroplating and electroless plating for applying a thin coating film of a metal such as copper, nickel or gold or a composite metal of these metals on the surface of a metal or a nonmetal and which has excellent stability, allows a uniform metal coating film to be formed, and is suitable for partial plating. SOLUTION: The gelatinous plating composition contains at least a plating solution, a gelling agent, a hardness adjusting agent, and a plating surface adjusting agent, and is characterized in that the pH is 2.0-7.5, and the gel strength is 100-900 g/cm<SP>2</SP>at a temperature of 20-80°C. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008266740(A) 申请公布日期 2008.11.06
申请号 JP20070112624 申请日期 2007.04.23
申请人 YOSHINO DENKA KOGYO INC 发明人 DERIBA MASAKO;YASUDA KAZUYA;SAITO MAKOTO
分类号 C25D3/00;C23C20/04;C25D5/00 主分类号 C25D3/00
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