| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a metal thin film on a base material, by which a metal thin film having a low specific resistance can be formed. SOLUTION: The method for forming a metal thin film on a base material comprises forming the metal thin film on the base material by using a plating solution containing a reductant for reducing the ions of a metal. In the method, as the reductant, a first reductant having a reducing ability to the ions of the metal and forming particles of the metal and a second reductant having a reducing ability to the ions of the metal and depositing the metal on the surface of each particle as a nucleus are used. COPYRIGHT: (C)2009,JPO&INPIT
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