| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for performing the detoxification treatment of a ruthenium etching composition after etching treatment to safely discard the ruthenium etching composition. SOLUTION: The ruthenium etching composition after etching treatment is brought into contact with activated carbon. The ruthenium etching composition desirably contain chlorine and water. COPYRIGHT: (C)2009,JPO&INPIT
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