SUBSTRATE PROCESSING APPARATUS FOR PREVENTING POWDER DEPOSITION AT INNER WALL OF CHAMBER

摘要

A substrate processing apparatus is provided to prevent the thin film from being deposited on the inner wall by heating up the chamber lid appropriately. A substrate processing apparatus(100) comprises a chamber body having internal space; a chamber including the chamber lid uniting with the upper end of the chamber body and shutting the internal space tightly(110); a substrate pallet installed at the internal space of the chamber(120); a gas supply unit supplying the raw material to the top of the substrate pallet; a thermal conditioning unit which is installed in order to prevent that the thin film is evaporated on the inner wall of the chamber.