APPARATUS FOR TREATING SUBSTRATE AND TREATING METHOD OF SUBSTRATE

摘要

An apparatus for treating substrate and a treating method of substrate are provided to effectively increase the temperature of substrate regardless of the material of the settling portion in which substrate is settled. An apparatus for treating substrate includes the settling portion(40) on which the substrate the substrate(200) is settled; the influx unit(60) connected to the separate space; the outlet part(90) connected to the separate space; the gas supply part(70) which is connected to the influx unit and supplies the gas to the separate space; the heating portion(80) heating up the gas supplied to the separate space. The substrate processing apparatus can effectively increase the temperature of substrate regardless of the material of the settling portion.