发明名称 CHEMICAL VAPOR DEPOSITION APPARATUS
摘要 A chemical vapor deposition equipment is provided to prevent particles are evaporated on an LCD substrate deposition by insulating spray gas using an insulating member installed at a diffuser body. A chemical vapor deposition equipment comprises a diffuser body installed at an upper space of a chamber, a shower head is formed a plurality of spray holes for spraying spray gas and is connected at the bottom side of the diffuser body, a plurality of fasteners(60B) for preventing a central part of the shower head being slack connected and fixed at a part of the spray holes which is located the central part of the shower head through the diffuser body, and an insulating member(100) for insulating the spray gas flowing toward a gap of the fastener and the spray holes by locating the insulating member in the lower part of each fastener and being closely supported to an inner wall surface of the spray holes.
申请公布号 KR100866912(B1) 申请公布日期 2008.11.04
申请号 KR20070053601 申请日期 2007.05.31
申请人 MICRO TECH CO., LTD. 发明人 SONG, SUNG TAI
分类号 C23C16/455;C23C16/00 主分类号 C23C16/455
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