发明名称 Illumination systems, exposure apparatus, and microdevice-manufacturing methods using same
摘要 Illumination systems are disclosed that illuminate a surface (M) for irradiation with illumination light emitted from a light source ( 5 ). An exemplary illumination system includes an incidence-side reflection-type fly-eye optical system ( 12 ) having multiple reflection-type partial optical systems arranged in rows, an emission-side reflection-type fly-eye optical system ( 14 ) having multiple reflection-type partial optical systems arranged in rows and corresponding to respective reflection-type partial optical systems of the incidence-side reflection-type fly-eye optical system ( 12 ), and a condensing optical system including two reflecting mirrors ( 18, 20 ) that guide illumination light, reflected by the emission-side reflection-type fly-eye optical system ( 14 ), to the surface (M). The center of curvature of at least one of the reflecting mirrors is optically eccentric with respect to a normal to the surface for irradiation at the center of the illuminated region.
申请公布号 US7446856(B2) 申请公布日期 2008.11.04
申请号 US20050281785 申请日期 2005.11.16
申请人 NIKON CORPORATION 发明人 KOMATSUDA HIDEKI
分类号 G03B27/54;G03B27/42 主分类号 G03B27/54
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