Methods and apparatus for generating dither mask through interpolation between preferred patterns

摘要

Techniques for generating dither masks are provided. A dither mask is generated by selecting a sequence of at least three original patterns comprising pixels of at least one of a first color and a second color. At least two patterns are interpolated to generate interpolated patterns in the sequence between the at least three original patterns. If a pattern having at least one specified characteristic exists in the sequence, the steps of interpolating between at least two patterns, and determining if a pattern having at least one specified characteristic exists in the sequence, are repeated. The interpolation is between at least one pattern from each side of the pattern having at least one specified characteristic in the sequence.