| 摘要 |
A plasma generating device is provided to efficiently block the premature reaction between the reaction gas and the source gas. A plasma generating device includes the plasma generation part(210); a plurality of induction pipes(262) providing the reaction gas nozzle passing through top and bottom for the plasma movement and is positioned at the lower part of the plasma generation part; a plurality of source gas nozzles(240) which are formed on the bottom surface and sprays the source gas; the shower head(250) which the bottom of the induction pipe is in the location higher than the source gas nozzle; the reacting gas providing unit(230) supplying the reaction gas to the plasma generation part; the source gas feed port supplying the source gas to the source gas space in the shower head.
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