发明名称 Integrated circuit switching device, structure and method of manufacture
摘要 An integrated circuit device can include a plurality of field effect transistors (FETs) having channel depths no greater than a first depth, and at least a first switch junction FET (JFET) having a source coupled to a signal transmission input node, a drain coupled to a signal transmission output node, and a gate. The first switch JFET has a channel depth greater than the first depth. Switch JFETs can enable low resistance configurable switch paths to be created for interconnecting different portions of a same integrated circuit device.
申请公布号 US2008265936(A1) 申请公布日期 2008.10.30
申请号 US20070796434 申请日期 2007.04.27
申请人 DSM SOLUTIONS, INC. 发明人 VORA MADHU P.
分类号 H03K19/177;H01L21/82;H03K17/687 主分类号 H03K19/177
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