发明名称 PHOTOSENSITIVE RESIN COMPOSITIONS
摘要 A photosensitive resin composition is provided to form a hard resin pattern having excellent solvent resistance and heat resistance with a high resolution. A photosensitive resin composition comprises a binder component(A) and a photopolymerization initiator(B). The binder component comprises a photopolymerizable compound(A1) having at least one carboxyl group and at least two unsaturated bonds capable of performing and a photopolymerizable compound(A2) without a carboxyl group. The average molecular weight of the binder component is 1,500 or less.
申请公布号 KR20080096414(A) 申请公布日期 2008.10.30
申请号 KR20080038164 申请日期 2008.04.24
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 YUKO NAKANO
分类号 G03F7/028 主分类号 G03F7/028
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