| 摘要 |
<p>RADIATION-SENSITIVE COMPOSITION FOR FORMING COLORED LAYER Provided is a radiation-sensitive composition used in the formation of a colored layer of a color filter, which can suppress contamination of a baking furnace, a photomask and the like due to sublimation of a radiation-sensitive polymerization initiator component, and which is free from the formation of foreign bodies in a solution yet also has excellent developability, patterned shape and the like. The radiation-sensitive resin composition for forming the colored layer, contains a colorant (A), an alkali-soluble resin (B), a polyfunctional monomer (C) and a radiation-sensitive polymerization initiator (D) containing as an essential component a compound represented by the following general formula (1)</p> |
