发明名称 SEMICONDUCTOR CHIP WITH POST-PASSIVATION SCHEME FORMED OVER PASSIVATION LAYER
摘要 The invention provides a semiconductor chip comprising an interconnecting structure over said passivation layer. The interconnecting structure comprises a first contact pad connected to a second contact pad exposed by an opening in a passivation layer. A metal bump is on the first contact pad and over multiple semiconductor devices, wherein the metal bump has more than 50 percent by weight of gold and has a height of between 8 and 50 microns
申请公布号 US2008265413(A1) 申请公布日期 2008.10.30
申请号 US20080132626 申请日期 2008.06.04
申请人 MEGICA CORPORATION 发明人 CHOU CHIU-MING;CHOU CHIEN-KANG;LIN CHING-SAN;LIN MOU-SHIUNG;LO HSIN-JUNG
分类号 H01L23/52 主分类号 H01L23/52
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