发明名称 |
Metal plating compositions |
摘要 |
Disclosed are metal plating compositions for plating a metal on a substrate. The metal plating compositions include compounds which influence the leveling and throwing performance of the metal plating compositions. Also disclosed are methods of depositing metals on a substrate.
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申请公布号 |
US2008269395(A1) |
申请公布日期 |
2008.10.30 |
申请号 |
US20080080484 |
申请日期 |
2008.04.02 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
REDDINGTON ERIK;DESMAISON GONZALO URRUTIA;NIAZIMBETOVA ZUKRA I.;CLEARY DONALD E.;LEFEBVRE MARK |
分类号 |
C08K3/08 |
主分类号 |
C08K3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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