| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent mixing of volatile metal component that cannot be removed by a gas filter when a corrosive gas is supplied to a semiconductor manufacturing apparatus. <P>SOLUTION: The gas supply system can be supply a highly corrosive gas to a semiconductor manufacturing apparatus (for example, heat treatment apparatus 110) through a gas supply passage 220, and it is provided with a gas filter 240 provided to the gas supply passage 220 and a metal component removal device 250 that is installed on the downstream of the installation position of the gas filter 240 of the gas supply passage 220 so as to liquefy and remove volatile metal component included in a gas passing the gas supply passage 220. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
