| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus, capable of increasing the amount and size of clusters produced by a magnetron sputtering method. SOLUTION: At least a portion of a sputtering gas after sputtering is exhausted at the upstream of a cluster discharge opening of a cluster production chamber against a gas flow so that the amount of the sputtering gas contained in a gas exhausted from the discharge opening becomes less than the amount introduced into the cluster production chamber. COPYRIGHT: (C)2009,JPO&INPIT
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