| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system where each substrate can be easily charged/discharged, and further, productive efficiency can be improved. SOLUTION: In the film deposition system 10 provided with: a chamber 11 into which a film deposition material gas can be introduced; and a pair of discharge electrodes provided inside the chamber 11 and composed of substrate arrangement electrodes 14 at which substrates 13 can be arranged and counter electrodes 21 oppositely arranged almost parallel to the substrate arrangement electrodes 14, the substrate arrangement electrodes 14 and the counter electrodes 21 are alternately arranged inside the chamber 11, the counter electrodes 21 are composed as grounding electrodes, and further, low frequency alternating voltage of 100 kHz to 2 MHz can be applied to the substrate arrangement electrodes 14. COPYRIGHT: (C)2009,JPO&INPIT
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