DEPOSITION ANALYSIS FOR ROBOT MOTION CORRECTION,申请号WO2007US82498-传众专利搜索

发明名称	DEPOSITION ANALYSIS FOR ROBOT MOTION CORRECTION
摘要	A center (410) of the deposited material (324) may be offset from a center (400) of the substrate (322). Measuring the offset between the centers (400, 410), may be utilized to correct the position of the substrate (322) on the pedestal (300) so that the deposited material (342) is concentrically deposited on the substrate (322).
申请公布号	WO2008052102(A3)	申请公布日期	2008.10.30
申请号	WO2007US82498	申请日期	2007.10.25
申请人	APPLIED MATERIALS, INC.;MARTIN, TODD, W.;SANSONI, STEVEN, V.;RICE, MICHAEL, R.;NG, ERIC;HUDGENS, JEFFREY, C.;GUCKEL, FREDERICK;KAPLAN, RUSSELL	发明人	MARTIN, TODD, W.;SANSONI, STEVEN, V.;RICE, MICHAEL, R.;NG, ERIC;HUDGENS, JEFFREY, C.;GUCKEL, FREDERICK;KAPLAN, RUSSELL
分类号	G06F19/00	主分类号	G06F19/00
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