| 摘要 |
<p>A developing device is provided to improve throughput by performing a development process while performing a consecutive working process for a substrate. A developing device comprises a pair of rotation body(41,42) disposed in parallel at a rotation axis, a transfer member(4) for a wafer, moved along the orbit of the rotation body, a transfer guide unit(31) for import disposed on the upper part of the transfer guide, a transfer part(32) for export disposed on the lower part of the transfer guide, a development liquid nozzle(71) for supplying development liquid to a wafer, a cleaning nozzle(72) for supplying a cleaning solution to the wafer, a gas nozzle(74) for supplying a gas to the wafer.</p> |
