| 摘要 |
<p>A substrate processing apparatus is provided to authentically wash the peripheral part of substrate. The substrate processing apparatus(1) is the substrate processing apparatus for the rinsing treatment about the peripheral part of substrate(W). This substrate processing apparatus comprises a substrate holding unit(3), a brush having the inclined cleaning surface about the longitudinal direction supported by substrate holding unit, griping substrate and the substrate gripped on the substrate picking device, and the brush transfer mechanism, for moving brush to the longitudinal direction, this and the traverse direction meeting at right angle and the load detection unit, for detecting the load applied about brush to the longitudinal direction and the first decision unit which determines whether it is not whether brush was arranged in the home location in which became the standards when guiding brush in the processing time location in which brush had to be arranged based on the output of the load detection unit in the rinsing treatment or not or not.</p> |
