发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES |
摘要 |
<p>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided. Figure 14b</p> |
申请公布号 |
SG146615(A1) |
申请公布日期 |
2008.10.30 |
申请号 |
SG20080065716 |
申请日期 |
2006.12.15 |
申请人 |
ASML NETHERLANDS B.V |
发明人 |
TROOST, KARS ZEGER;BASELMANS, JOHANNES JACOBUS MATHEUS;BLEEKER, ARNO JAN;GREENEICH, JAMES SHERWOOD |
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