发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD |
摘要 |
<p>LITHOGRAPHIC APPARATUS AND METHOD A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table constructed and arranged to hold a substrate. The substrate table includes a substrate support plate that is in thermal contact with a thermal conditioning plate. The apparatus further includes a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of the substrate.</p> |
申请公布号 |
SG146541(A1) |
申请公布日期 |
2008.10.30 |
申请号 |
SG20080018160 |
申请日期 |
2008.03.04 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOOGENDAM CHRISTIAAN, ALEXANDER;JANSSEN FRANCISCUS, JOHANNES, JOSEPH |
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