发明名称 FLUORIDE GAS REMOVAL APPARATUS AND REMOVAL METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a fluoride gas removal apparatus and a removal method for removing fluoride gas by supplying energy with electromagnetic wave thereby generating plasma, generating high temperature plasma flame by supplying gaseous or liquid hydrogen or hydrocarbon fuel to the plasma, and using it. <P>SOLUTION: The fluoride gas removal apparatus includes: a magnetron 10 oscillating electromagnetic wave; a circulator 30 absorbing reflection wave reflected by the magnetron 10; a directional coupler 40 monitoring the intensity of the electromagnetic wave with incident wave and reflection wave; a stub tuner 50 matching impedance; a wave guide tube 60 receiving the electromagnetic wave transmitted from the stub tuner; a discharge tube 70 forming plasma by the electromagnetic wave input through the wave guide tube and vortex gas injected from the outside; a vortex gas supply part 80 supplying the vortex gas to the discharge tube; an igniting part 90 supplying initial electrons for generating the plasma in the discharge tube; and a fuel and waste gas supply part 100 supplying fuel and waste gas to the plasma in the discharge tube. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008259953(A) 申请公布日期 2008.10.30
申请号 JP20070104065 申请日期 2007.04.11
申请人 UM HANG-SUB 发明人 UM HANG-SUB
分类号 B01D53/68;B01J19/08;F23G7/06 主分类号 B01D53/68
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