发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 A laser diode includes a first n-cladding layer disposed on and lattice-matched to an n-semiconductor substrate, wherein the first n-cladding layer is n-AlGaInP or n-GaInP; a second n-cladding layer of n-AlGaAs supported by the first n-cladding layer; and an inserted layer disposed between the first n-cladding layer and the second n-cladding layer, wherein the inserted layer includes the same elements as the first n-cladding layer, the inserted layer has the same composition ratios of Al and Ga (and P) as the first n-cladding layer, and the inserted layer contains a lower composition ratio of In than the first n-cladding layer.
申请公布号 US2008265275(A1) 申请公布日期 2008.10.30
申请号 US20080115565 申请日期 2008.05.06
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 HANAMAKI YOSHIHIKO;ONO KENICHI;TAKEMI MASAYOSHI;TAKADA MAKOTO
分类号 H01L21/00;H01S5/32 主分类号 H01L21/00
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