| 摘要 |
<p>An exposure apparatus is provided to adjust accurately focus by preventing the measurement point of focus on a scribe line. An exposure apparatus comprises a projection optical system(11); a disk stage(5); a substrate stage; a measurement device for measuring a position of the substrate, an operation control processor for movement of the disk stage, the substrate stage, and measurement device; an information input device for imputing a measured information by the measurement device. A method of manufacturing a device comprises exposing a substrate by using the exposure apparatus, developing the exposed substrate, and processing developed substrate.</p> |
