| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an atmosphere control device which maintains gas atmosphere near a process part by preventing entering of outside air into a process device, and reduces the amount of use of process gas by preventing flowing out of the process gas from the process part. <P>SOLUTION: An object to be processed 1 is mounted on a transportation mechanism 2, and is transported in the direction of process parts 7a and 7b (direction of arrow B) by the transportation mechanism 2. The process parts 7a and 7b comprise gas curtain mechanisms 3a-1, 3a-2, 3b-1, 3b-2, 3c-1, 3c-2, 3d-1, and 3d-2, exhaust process mechanisms 4a-1, 4a-2, 4b-1, 4b-2, 4c-1, 4c-2, 4d-1, and 4d-2, and plasma process parts 5a and 5b. The gas curtain mechanisms 3a-1, 3a-2, 3b-1, 3b-2, 3c-1, 3c-2, 3d-1, and 3d-2 comprise a gas jetting nozzle 10 respectively. The exhaust process mechanisms 4a-1, 4a-2, 4b-1, 4b-2, 4c-1, 4c-2, 4d-1, and 4d-2 comprise an exhaust nozzle 11 respectively. <P>COPYRIGHT: (C)2009,JPO&INPIT |
