发明名称 |
METHOD OF DESIGNING SEMICONDUCTOR INTEGRATED CIRCUIT, APPARATUS FOR DESIGNING SEMICONDUCTOR INTEGRATED CIRCUIT, RECORDING MEDIUM, AND METHOD FOR MANUFACTURING MASK |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To simplify a design of a semiconductor integrated circuit without deteriorating screening accuracy. <P>SOLUTION: A method of designing the semiconductor integrated circuit upon creating a physical layout of the semiconductor integrated circuit from semiconductor integrated circuit data includes: a cell arranging and wiring step of arranging and wiring cells for creating a physical layout; a design-rule checking step of verifying a shape of a second physical layout including the cells of the physical layout with reference to a rule library for design rule check; a mask-data processing step of performing, when the design rule is not satisfied, mask data processing for the verification-object second physical layout; a mask-data creating step for creating mask data using the second physical layout subjected to the mask data processing in the mask-data processing data; and a mask-data creating step of creating mask data corresponding to the physical layout using the second physical layout when the design rule is satisfied. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2008262162(A) |
申请公布日期 |
2008.10.30 |
申请号 |
JP20080008735 |
申请日期 |
2008.01.18 |
申请人 |
SONY CORP |
发明人 |
DEWA KYOKO |
分类号 |
G03F1/36;G03F1/68;G03F1/70;G03F1/84;G06F17/50;H01L21/82 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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