发明名称 REDUCING FAST IONS IN A PLASMA RADIATION SOURCE HAVING A SECOND ACTIVATION SOURCE
摘要 Reducing Fast Ions in a Plasma Radiation Source A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct during the discharge a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.
申请公布号 WO2008075952(A3) 申请公布日期 2008.10.30
申请号 WO2007NL50670 申请日期 2007.12.19
申请人 ASML NETHERLANDS B.V.;IVANOV, VLADIMIR VITALEVITCH;BANINE, VADIM YEVGENYEVICH;KOSHELEV, KONSTANTIN NIKOLAEVITCH 发明人 IVANOV, VLADIMIR VITALEVITCH;BANINE, VADIM YEVGENYEVICH;KOSHELEV, KONSTANTIN NIKOLAEVITCH
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
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