| 摘要 |
<p>A harged particle beam writing apparatus and method are provided to reduce mismatching of beam's writing position. A beam writing apparatus(100) comprises an irradiation unit for harged particle, a deflector for harged particle, a stage for a sample, an objective lens(207) for beam focusing, calculation units for collecting mismatching of beam's position and beam's quantity caused by a first magnetic wave and a second magnetic wave of an eddy current, and a beam deflection control unit for controlling a deflector(205).</p> |
