| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection exposure device capable of irradiating the luminance flux of a wide spectral distribution including a plurality of emission lines in a state not causing the deviation of an image forming position caused by color aberration. SOLUTION: The projection exposure device (100) comprises: a light source (10) for irradiating exposure light including the emission lines such as g, h, i and j; a wavelength selection part (15) for selecting the luminous flux including the emission lines of a prescribed combination from the exposure light; a mask stage (40) for positioning a photomask where a pattern is drawn; an Ophner type reflection-type projection optical system (50) for irradiating the exposure light selected in the wavelength selection part to the photomask and projecting the exposure light transmitted through the photomask to a substrate; and a substrate stage (60) for positioning the substrate. COPYRIGHT: (C)2009,JPO&INPIT |
