发明名称 HIGH TEMPERATURE METHODS FOR ENHANCING RETENTION CHARACTERISTICS OF MEMORY DEVICES
摘要 Methods are described for improving the retention of a memory device by execution of a retention improvement procedure. The retention improvement procedure comprises a baking process of the memory device in a high temperature environment, a verifying process of the memory device that checks the logic state of memory cells, and a reprogramming process to program the memory device once again by programming memory cells in a 0-state to a high-Vt state. The baking step of placing the memory device in a high temperature environment causes a charge loss by expelling shallow trapped charges, resulting in the improvement of retention reliability.
申请公布号 US2008268659(A1) 申请公布日期 2008.10.30
申请号 US20070741053 申请日期 2007.04.27
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 WU CHAO-I;HSU TZU HSUAN
分类号 H01L21/77 主分类号 H01L21/77
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