| 摘要 |
A substrate treatment apparatus ( 1 ) capable of performing the surface treatment of a treated substrate (W) by placing the treated substrate on a substrate support body ( 2 ) and dripping a treatment liquid on the surface of the substrate while rotating the substrate support body ( 2 ). The substrate support body ( 2 ) comprises a circular casserole-like base ( 3 ), a top board ( 10 ) generally formed in a disk shape, having a longitudinal cross section of reverse trapezoidal shape, and fitted to the upper opening of the base, and a hollow rotating shaft ( 15 ) fitted to the base ( 3 ) or the top board ( 10 ) at its rotating axis. The apparatus is characterized in that a gas blowout nozzle ( 14 ) comprising a plurality of slit-like grooves radially extending from the hollow rotating shaft ( 15 ) to the outside is formed in at least one surface selected from the contact surface ( 13 ) of the top board ( 10 ) and the upper opening contact surface ( 5 a) of the base ( 3 ) brought into contact with each other by the fitting. Thus, the substrate treatment apparatus having the substrate support body can be easily assembled by eliminating the need of adjusting the gas blowout nozzle in assembling.
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