| 发明名称 |
METHOD FOR LOW-TEMPERATURE SEALING OF A CAVITY UNDER VACUUM OR UNDER CONTROLLED ATMOSPHERE |
| 摘要 |
This method for sealing a cavity of a component placed in the chamber is carried out by physical vapour deposition (PVD) of germanium or silicon.
|
| 申请公布号 |
US2008268580(A1) |
申请公布日期 |
2008.10.30 |
| 申请号 |
US20080171530 |
申请日期 |
2008.07.11 |
| 申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
ANDRE BERNARD;ARNAUD AGNES |
| 分类号 |
H01L21/56 |
主分类号 |
H01L21/56 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
