Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process

摘要

A photosensitive composition having an extremely constant photosensitivity distribution relative to an exposure light having a wavelength of 400 nm to 410 nm, and excelling in pattern reproductivity, suppressing variations in pattern formation; a pattern forming material and a photosensitive laminate with the photosensitive composition laminated thereon; and a pattern forming apparatus and a pattern forming process. The photosensitive composition contains a binder, a polymerizable compound, and a photopolymerization initiator; the photosensitive composition has a maximum spectral sensitivity in the wavelength range of 380 nm to 420 nm; the minimum exposure dose S₄₀₀ capable of forming a pattern at a wavelength of 400 nm of the photosensitive composition is 300 mJ/cm² or less; the minimum exposure dose S₄₁₀ capable of forming a pattern at a wavelength of 410 nm of the photosensitive composition is 300 mJ/cm² or less; and S₄₀₀ and S₄₁₀ satisfy the relation 0.6400/S₄₁₀<1.6.