HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTY AND METHOD OF PATTERNING MATERIALS USING THE SAME

摘要

A hard mask composition having the anti-reflection property useful in the lithographic process of the shorter wavelength is provided to realize excellent optical property, and mechanical property and etching selectivity, to be coated by using the spin-on coating technique and to ensure the minimum remain acid content. A hard mask composition having the anti-reflection property comprises the polymer containing the aromatic ring indicated as the chemical formula 1. In the equation, N is the range of 1<=n<190. R1 is selected from hydrogen, -OH, the C1-10 alkyl group, the C6-10 aryl, the allyl group and halogen atom heavy. R2 is selected from the amino radical (-NH2), the alkoxy radical (-OR, wherein R is the C1-10 alkyl group or the C6-10 aryl), and dialkylamino radical (-NRR', wherein R and R' are the respective C1-10 alkyl group or the C6-10 aryl). R3 is selected from the chemical formula 1 or the chemical formula 2.