| 摘要 |
An exposure apparatus EX includes a projection optical system PL which forms an image of a first pattern in a first exposure area AR1 and which forms an image of a second pattern in a second exposure area AR2; and an adjusting device which adjusts a surface positional relationship between a surface of a substrate P and a first image plane IS1 for forming the image of the first pattern thereon and which adjusts a surface positional relationship between the surface of the substrate P and a second image plane IS2 for forming the image of the second pattern thereon when a shot area on the substrate P is subjected to multiple exposure with the image of the first pattern and the image of the second pattern via a projection optical system PL. The substrate can be subjected to the multiple exposure satisfactorily and efficiently.
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