| 摘要 |
An overlay measurement system of a semiconductor device is provided to measure the accuracy value of overlay by preventing the error of measurement caused by scattered light and light of large intensity. An overlay measurement system of a semiconductor device comprises a light source generator(110); an object lens(120) focusing the light source at a wafer and receiving reflected light from the wafer; a polarizing plate(130) receiving the reflected light and outputting to a polarized light source; a first spectroscopic light source(140) for generating plural spectroscopic light sources having different light paths; a measurement pickup device(150) for projecting one of the plural spectroscopic light source to detect RGB signal and obtaining an image pattern of the wafer.
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