SUBSTRATE ATTRACTING DEVICE AND SUBSTRATE TRANSFER APPARATUS

摘要

A substrate absorbing device and a substrate transfer apparatus are provided to surely absorb and transfer a substrate, which is bent or warp, by selecting one surface of the substrate and holding the absorbed state of substrate. A pincette(17) of a substrate absorbing device comprises a first absorbing unit(171) for absorbing and holding a semiconductor wafer at the upper side based on the principles of Bernoulli; a second absorbing unit(172) for absorbing and holding a semiconductor wafer at the lower side based on the aspiration of outside. The first absorbing unit includes plural concave portions formed on the under part thereof and an opening for discharging the gas from the concave portions.