| 摘要 |
A confinement ring assembly of a plasma treatment apparatus includes a cam ring disposed above the process chamber, a plurality of plungers disposed about a process chamber of the apparatus and operated by the cam ring, and a plurality of confinement rings coupled to the plungers. The plasma rings surround a plasma processing space in the process chamber. Each of the plungers includes a rod, a bearing block to which the rod is fixed and engaged with the cam ring such that the rod is moved up or down when the cam ring is rotated, a cylinder through which the rod extends, and a bushing fixed to the bottom of the cylinder. The confinement rings include an upper confinement ring fitted to the bushing of each of the plungers, and at least one lower confinement ring coupled to a lower end of the rod of each of the plungers. At least one lower confinement ring has an inner peripheral portion that extends upwardly to form a vertically extending inner wall. The inner wall confronts and is spaced from an inner side wall surface of at least one of the other confinement rings. Thus, the inner wall prevents plasma within the process chamber from penetrating into at least one gap between the confinement rings. Also, the inner wall presents an inner side wall surface having a relatively large surface area for polymer to cling to. Thus, the polymer is not likely to fall of the surface and thereby contaminate a substrate.
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