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发明名称
Blank mask and manufacturing method of Photo-mask using the same
摘要
申请公布号
KR100864375(B1)
申请公布日期
2008.10.21
申请号
KR20070000311
申请日期
2007.01.02
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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