| 摘要 |
[PROBLEMS] To provide a mask blank and a photomask suitable for processes (resist coating method, etching method, rinsing method, and so forth) in a large mask for an FPD device. [MEANS FOR SOLVING THE PROBLEMS] This mask blank for manufacturing an FPD device has at least either of a light-shielding film and a semi-light transmission film with a function of adjusting the amount of transmission on a light transmission substrate. The mask blank is characterized in that the light-shielding film and the semi-light transmission film have a root means square roughness Rq of 2.0 nm or less of the surface of the film. |
